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350-nm band edge-emitting laser diodes enabled by low-dislocation-density AlGaN templates

  • Mary H. Crawford
  • , Andrew A. Allerman
  • , Andrew M. Armstrong
  • , Jonathan J. Wierer
  • , Weng W. Chow
  • , Michael W. Moseley
  • , Michael L. Smith
  • , Karen C. Cross

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Realization of efficient laser diodes with ultra-violet (UV) emission from ∼260-360 nm would enable many applications including fluorescence-based biological agent detection, sterilization, and portable water purification. While InGaN-based laser diodes are well developed down to ∼370 nm, achieving shorter UV wavelengths requires higher Al-content AlGaN alloys with increasing challenges in achieving p-type doping, strain-management, and low threading-dislocation-density (TDD) AlGaN templates. Given these challenges, few groups have reported AlGaN-based edge-emitting laser diodes (LDs) with emission < 355 nm.[1, 2] Most recently, random lasing via Anderson localization in AlGaN nanowire structures has demonstrated a novel approach to realizing deep-UV laser diodes.[3]
Original languageEnglish
Title of host publication2015 IEEE Summer Topicals Meeting Series, SUM 2015
Pages121-122
Number of pages2
DOIs
StatePublished - Sep 9 2015
Externally publishedYes

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