Amorphous zirconium-nickel films formed by solid state reactions

B. M. Clemens; W. L. Johnson; R. B. Schwarz

doi:10.1016/0022-3093(84)90643-4

Amorphous zirconium-nickel films formed by solid state reactions

B. M. Clemens
, W. L. Johnson
, R. B. Schwarz

Research output: Contribution to journal › Article › peer-review

126 Scopus citations

Abstract

We have formed an amorphous zirconium-nickel phase by annealing vapor deposited crystalline layers of elemental zirconium and nickel. Auger depth profiling and x-ray diffraction have been used to monitor the reaction. The thermodynamics of the process is explained in terms of a metastable free energy diagram which reflects the large negative heat of mixing between zirconium and nickel. The formation of an amorphous layer occurs via a diffusion limited reaction occurring at the zirconium-nickel interface. © 1984.

Original language	English
Pages (from-to)	817-822
Number of pages	6
Journal	Journal of Non-Crystalline Solids
Volume	61-62
Issue number	PART 2
DOIs	https://doi.org/10.1016/0022-3093(84)90643-4
State	Published - Jan 1 1984
Externally published	Yes

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title = "Amorphous zirconium-nickel films formed by solid state reactions",

abstract = "We have formed an amorphous zirconium-nickel phase by annealing vapor deposited crystalline layers of elemental zirconium and nickel. Auger depth profiling and x-ray diffraction have been used to monitor the reaction. The thermodynamics of the process is explained in terms of a metastable free energy diagram which reflects the large negative heat of mixing between zirconium and nickel. The formation of an amorphous layer occurs via a diffusion limited reaction occurring at the zirconium-nickel interface. {\textcopyright} 1984.",

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AU - Johnson, W. L.

AU - Schwarz, R. B.

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Y1 - 1984/1/1

N2 - We have formed an amorphous zirconium-nickel phase by annealing vapor deposited crystalline layers of elemental zirconium and nickel. Auger depth profiling and x-ray diffraction have been used to monitor the reaction. The thermodynamics of the process is explained in terms of a metastable free energy diagram which reflects the large negative heat of mixing between zirconium and nickel. The formation of an amorphous layer occurs via a diffusion limited reaction occurring at the zirconium-nickel interface. © 1984.

AB - We have formed an amorphous zirconium-nickel phase by annealing vapor deposited crystalline layers of elemental zirconium and nickel. Auger depth profiling and x-ray diffraction have been used to monitor the reaction. The thermodynamics of the process is explained in terms of a metastable free energy diagram which reflects the large negative heat of mixing between zirconium and nickel. The formation of an amorphous layer occurs via a diffusion limited reaction occurring at the zirconium-nickel interface. © 1984.

UR - https://www.scopus.com/pages/publications/0020495527

U2 - 10.1016/0022-3093(84)90643-4

DO - 10.1016/0022-3093(84)90643-4

M3 - Article

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SP - 817

EP - 822

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

IS - PART 2

ER -

Amorphous zirconium-nickel films formed by solid state reactions

Abstract

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