Characterization of NiO thin films on α-Al<inf>2</inf>O<inf>3</inf> before and after heat treatment

Paul G. Kotula; C. Barry Carter

Characterization of NiO thin films on α-Al<inf>2</inf>O<inf>3</inf> before and after heat treatment

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

6 Scopus citations

Abstract

The article presents a study on the thin films of NiO deposited on single crystal alpha Al2O3 substrates before and after pulsed laser ablation. Transmission electron microscopy is used to study the oxide film growth. Cross section specimens and high resolution backscattered electron imaging in FESEM is utilized to analyze solid state reactions between the thin film and the single crystal substrates.

Original language	English
Title of host publication	Proceedings - Annual Meeting, Microscopy Society of America
Pages	1120-1121
Number of pages	2
State	Published - Dec 1 1993
Externally published	Yes

Cite this

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title = "Characterization of NiO thin films on α-Al2O3 before and after heat treatment",

abstract = "The article presents a study on the thin films of NiO deposited on single crystal alpha Al2O3 substrates before and after pulsed laser ablation. Transmission electron microscopy is used to study the oxide film growth. Cross section specimens and high resolution backscattered electron imaging in FESEM is utilized to analyze solid state reactions between the thin film and the single crystal substrates.",

author = "Kotula, \{Paul G.\} and Carter, \{C. Barry\}",

year = "1993",

month = dec,

day = "1",

language = "English",

pages = "1120--1121",

booktitle = "Proceedings - Annual Meeting, Microscopy Society of America",

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T1 - Characterization of NiO thin films on α-Al2O3 before and after heat treatment

AU - Kotula, Paul G.

AU - Carter, C. Barry

PY - 1993/12/1

Y1 - 1993/12/1

N2 - The article presents a study on the thin films of NiO deposited on single crystal alpha Al2O3 substrates before and after pulsed laser ablation. Transmission electron microscopy is used to study the oxide film growth. Cross section specimens and high resolution backscattered electron imaging in FESEM is utilized to analyze solid state reactions between the thin film and the single crystal substrates.

AB - The article presents a study on the thin films of NiO deposited on single crystal alpha Al2O3 substrates before and after pulsed laser ablation. Transmission electron microscopy is used to study the oxide film growth. Cross section specimens and high resolution backscattered electron imaging in FESEM is utilized to analyze solid state reactions between the thin film and the single crystal substrates.

UR - https://www.scopus.com/pages/publications/0027705658

M3 - Conference contribution

SP - 1120

EP - 1121

BT - Proceedings - Annual Meeting, Microscopy Society of America

ER -

Characterization of NiO thin films on α-Al<inf>2</inf>O<inf>3</inf> before and after heat treatment

Abstract

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