Characterization of NiO thin films on α-Al2O3 before and after heat treatment

Paul G. Kotula; C. Barry Carter

Characterization of NiO thin films on α-Al₂O₃ before and after heat treatment

Research output: Contribution to journal › Conference article › peer-review

Abstract

The article presents a study on the thin films of NiO deposited on single crystal alpha Al₂O₃ substrates before and after pulsed laser ablation. Transmission electron microscopy is used to study the oxide film growth. Cross section specimens and high resolution backscattered electron imaging in FESEM is utilized to analyze solid state reactions between the thin film and the single crystal substrates.

Original language	English
Pages (from-to)	1120-1121
Number of pages	2
Journal	Proceedings - Annual Meeting, Microscopy Society of America
State	Published - 1993
Externally published	Yes
Event	Proceedings of the 51st Annual Meeting Microscopy Society of America - Cincinnati, OH, USA Duration: Aug 1 1993 → Aug 6 1993

Cite this

@article{0c887c3c12c84a66be927b22b5c9e8f0,

title = "Characterization of NiO thin films on α-Al2O3 before and after heat treatment",

abstract = "The article presents a study on the thin films of NiO deposited on single crystal alpha Al2O3 substrates before and after pulsed laser ablation. Transmission electron microscopy is used to study the oxide film growth. Cross section specimens and high resolution backscattered electron imaging in FESEM is utilized to analyze solid state reactions between the thin film and the single crystal substrates.",

author = "Kotula, \{Paul G.\} and Carter, \{C. Barry\}",

year = "1993",

language = "English",

pages = "1120--1121",

journal = "Proceedings - Annual Meeting, Microscopy Society of America",

issn = "0424-8201",

note = "Proceedings of the 51st Annual Meeting Microscopy Society of America ; Conference date: 01-08-1993 Through 06-08-1993",

}

TY - JOUR

T1 - Characterization of NiO thin films on α-Al2O3 before and after heat treatment

AU - Kotula, Paul G.

AU - Carter, C. Barry

PY - 1993

Y1 - 1993

N2 - The article presents a study on the thin films of NiO deposited on single crystal alpha Al2O3 substrates before and after pulsed laser ablation. Transmission electron microscopy is used to study the oxide film growth. Cross section specimens and high resolution backscattered electron imaging in FESEM is utilized to analyze solid state reactions between the thin film and the single crystal substrates.

AB - The article presents a study on the thin films of NiO deposited on single crystal alpha Al2O3 substrates before and after pulsed laser ablation. Transmission electron microscopy is used to study the oxide film growth. Cross section specimens and high resolution backscattered electron imaging in FESEM is utilized to analyze solid state reactions between the thin film and the single crystal substrates.

UR - https://www.scopus.com/pages/publications/0027705658

M3 - Conference article

AN - SCOPUS:0027705658

SN - 0424-8201

SP - 1120

EP - 1121

JO - Proceedings - Annual Meeting, Microscopy Society of America

JF - Proceedings - Annual Meeting, Microscopy Society of America

T2 - Proceedings of the 51st Annual Meeting Microscopy Society of America

Y2 - 1 August 1993 through 6 August 1993

ER -

Characterization of NiO thin films on α-Al2O3 before and after heat treatment

Abstract

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Characterization of NiO thin films on α-Al₂O₃ before and after heat treatment