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DEFECT STRUCTURE OF ION-IMPLANTED Al//xGa//1// minus //xAs/GaAs SUPERLATTICES.

  • B. C. DeCooman
  • , C. B. Carter
  • , J. Ralston
  • , G. W. Wicks
  • , L. F. Eastman

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Scopus citations

Abstract

Cross-sectional transmission electron microscopy (XTEM) has been used to study the defect structure and intermixing of ion-implanted and annealed Al//xGa//1// minus //xAs/GaAs superlattices. The results show clearly that the layer intermixing depends on mass and energy of the implanted species and the annealing conditions. The temperature and duration of annealing determines mainly the amount of residual damage. In addition it was observed that in all cases the point-defects agglomeration was influenced by the strain field present at the layer interfaces; extended defects nucleate preferentially in the GaAs layers.
Original languageEnglish
Title of host publicationMaterials Research Society Symposia Proceedings
Pages333-338
Number of pages6
Volume56
StatePublished - Dec 1 1986
Externally publishedYes

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