Abstract
Using density-functional total energy calculations, we investigated N interstitial migration in GaN. Two migration paths were considered. The first path confines motion to a single c -plane of the lattice, while the second path involves movement both perpendicular and parallel to the c -axis. The latter path has a lower barrier for the positive charge states and will be the dominant mechanism for migration of the N interstitial in p -type GaN. The calculated barriers are 1.79, 2.12, and 1.98 eV for the +1, +2, and +3 charge states. These barriers are consistent with recent experimental results and indicate that interstitials will be mobile at typical processing temperatures. © 2006 American Institute of Physics.
| Original language | English |
|---|---|
| Journal | Journal of Applied Physics |
| Volume | 100 |
| Issue number | 12 |
| DOIs | |
| State | Published - Dec 1 2006 |
| Externally published | Yes |
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