Development of a laboratory extreme-ultraviolet lithography tool

Daniel A. Tichenor; Glenn D. Kubiak; Michael E. Malinowski; Richard H. Stulen; Steven J. Haney; Kurt W. Berger; Rodney P. Nissen; G. A. Wilkerson; Phillip H. Paul; S. R. Birtola; P. S. Jin; Richard W. Arling; Avi K. Ray-Chaudhuri; William C. Sweatt; Weng W. Chow; John E. Bjorkholm; Richard R. Freeman; Marc D. Himel; Alastair A. MacDowell; Donald M. Tennant; L. A. Fetter; Obert R. Wood; Warren K. Waskiewicz; Donald L. White; David L. Windt; Tanya E. Jewell

doi:10.1117/12.175834

Development of a laboratory extreme-ultraviolet lithography tool

Daniel A. Tichenor
, Glenn D. Kubiak
, Michael E. Malinowski
, Richard H. Stulen
, Steven J. Haney
, Kurt W. Berger
, Rodney P. Nissen
, G. A. Wilkerson
, Phillip H. Paul
, S. R. Birtola
, P. S. Jin
, Richard W. Arling
, Avi K. Ray-Chaudhuri
, William C. Sweatt
, Weng W. Chow
, John E. Bjorkholm
, Richard R. Freeman
, Marc D. Himel
, Alastair A. MacDowell
, Donald M. Tennant

L. A. Fetter, Obert R. Wood, Warren K. Waskiewicz, Donald L. White, David L. Windt, Tanya E. Jewell

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

13 Scopus citations

Abstract

The development of a laboratory EUV lithography tool based on a laser plasma source, a 10x Schwarzschild camera, and a magnetically levitated wafer stage is presented. Interferometric measurements of the camera aberrations are incorporated into physical-optics simulations to estimate the EUV imaging performance of the camera. Experimental results demonstrate the successful matching of five multilayer reflecting surfaces, coated to specification for a wide range of figure and incidence angle requirements. High-resolution, 10x-reduction images of a reflection mask are shown.

Original language	English
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Pages	95-105
Number of pages	11
Volume	2194
DOIs	https://doi.org/10.1117/12.175834
State	Published - Jan 1 1994
Externally published	Yes

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10.1117/12.175834

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Tichenor, D. A., Kubiak, G. D., Malinowski, M. E., Stulen, R. H., Haney, S. J., Berger, K. W., Nissen, R. P., Wilkerson, G. A., Paul, P. H., Birtola, S. R., Jin, P. S., Arling, R. W., Ray-Chaudhuri, A. K., Sweatt, W. C., Chow, W. W., Bjorkholm, J. E., Freeman, R. R., Himel, M. D., MacDowell, A. A., ... Jewell, T. E. (1994). Development of a laboratory extreme-ultraviolet lithography tool. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 2194, pp. 95-105) https://doi.org/10.1117/12.175834

@inproceedings{f3e3dadb967d4c7f973fd721bc3642eb,

title = "Development of a laboratory extreme-ultraviolet lithography tool",

abstract = "The development of a laboratory EUV lithography tool based on a laser plasma source, a 10x Schwarzschild camera, and a magnetically levitated wafer stage is presented. Interferometric measurements of the camera aberrations are incorporated into physical-optics simulations to estimate the EUV imaging performance of the camera. Experimental results demonstrate the successful matching of five multilayer reflecting surfaces, coated to specification for a wide range of figure and incidence angle requirements. High-resolution, 10x-reduction images of a reflection mask are shown.",

author = "Tichenor, \{Daniel A.\} and Kubiak, \{Glenn D.\} and Malinowski, \{Michael E.\} and Stulen, \{Richard H.\} and Haney, \{Steven J.\} and Berger, \{Kurt W.\} and Nissen, \{Rodney P.\} and Wilkerson, \{G. A.\} and Paul, \{Phillip H.\} and Birtola, \{S. R.\} and Jin, \{P. S.\} and Arling, \{Richard W.\} and Ray-Chaudhuri, \{Avi K.\} and Sweatt, \{William C.\} and Chow, \{Weng W.\} and Bjorkholm, \{John E.\} and Freeman, \{Richard R.\} and Himel, \{Marc D.\} and MacDowell, \{Alastair A.\} and Tennant, \{Donald M.\} and Fetter, \{L. A.\} and Wood, \{Obert R.\} and Waskiewicz, \{Warren K.\} and White, \{Donald L.\} and Windt, \{David L.\} and Jewell, \{Tanya E.\}",

year = "1994",

month = jan,

day = "1",

doi = "10.1117/12.175834",

language = "English",

isbn = "0819414891",

volume = "2194",

pages = "95--105",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

}

Tichenor, DA, Kubiak, GD, Malinowski, ME, Stulen, RH, Haney, SJ, Berger, KW, Nissen, RP, Wilkerson, GA, Paul, PH, Birtola, SR, Jin, PS, Arling, RW, Ray-Chaudhuri, AK, Sweatt, WC, Chow, WW, Bjorkholm, JE, Freeman, RR, Himel, MD, MacDowell, AA, Tennant, DM, Fetter, LA, Wood, OR, Waskiewicz, WK, White, DL, Windt, DL & Jewell, TE 1994, Development of a laboratory extreme-ultraviolet lithography tool. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 2194, pp. 95-105. https://doi.org/10.1117/12.175834

TY - GEN

T1 - Development of a laboratory extreme-ultraviolet lithography tool

AU - Tichenor, Daniel A.

AU - Kubiak, Glenn D.

AU - Malinowski, Michael E.

AU - Stulen, Richard H.

AU - Haney, Steven J.

AU - Berger, Kurt W.

AU - Nissen, Rodney P.

AU - Wilkerson, G. A.

AU - Paul, Phillip H.

AU - Birtola, S. R.

AU - Jin, P. S.

AU - Arling, Richard W.

AU - Ray-Chaudhuri, Avi K.

AU - Sweatt, William C.

AU - Chow, Weng W.

AU - Bjorkholm, John E.

AU - Freeman, Richard R.

AU - Himel, Marc D.

AU - MacDowell, Alastair A.

AU - Tennant, Donald M.

AU - Fetter, L. A.

AU - Wood, Obert R.

AU - Waskiewicz, Warren K.

AU - White, Donald L.

AU - Windt, David L.

AU - Jewell, Tanya E.

PY - 1994/1/1

Y1 - 1994/1/1

N2 - The development of a laboratory EUV lithography tool based on a laser plasma source, a 10x Schwarzschild camera, and a magnetically levitated wafer stage is presented. Interferometric measurements of the camera aberrations are incorporated into physical-optics simulations to estimate the EUV imaging performance of the camera. Experimental results demonstrate the successful matching of five multilayer reflecting surfaces, coated to specification for a wide range of figure and incidence angle requirements. High-resolution, 10x-reduction images of a reflection mask are shown.

AB - The development of a laboratory EUV lithography tool based on a laser plasma source, a 10x Schwarzschild camera, and a magnetically levitated wafer stage is presented. Interferometric measurements of the camera aberrations are incorporated into physical-optics simulations to estimate the EUV imaging performance of the camera. Experimental results demonstrate the successful matching of five multilayer reflecting surfaces, coated to specification for a wide range of figure and incidence angle requirements. High-resolution, 10x-reduction images of a reflection mask are shown.

UR - https://www.scopus.com/pages/publications/0028733226

U2 - 10.1117/12.175834

DO - 10.1117/12.175834

M3 - Conference contribution

SN - 0819414891

SN - 9780819414892

VL - 2194

SP - 95

EP - 105

BT - Proceedings of SPIE - The International Society for Optical Engineering

ER -

Development of a laboratory extreme-ultraviolet lithography tool

Abstract

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