Dynamics and morphology of cracks in silicon nitride films: a molecular dynamics study on parallel computers

Aiichiro Nakano; Rajiv K. Kalia; Priya Vashishta

Dynamics and morphology of cracks in silicon nitride films: a molecular dynamics study on parallel computers

Aiichiro Nakano
, Rajiv K. Kalia
, Priya Vashishta

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Scopus citations

Abstract

Multiresolution molecular dynamics approach on parallel computers has been used to investigate fracture in ceramic materials. In microporous silica, critical behavior at fracture is analyzed in terms of pore percolation and kinetic roughening of fracture surfaces. Crack propagation in amorphous silicon nitride films is investigated, and a correlation between the speed of crack propagation and the morphology of fracture surfaces is observed. In crystalline silicon nitride films, temperature-assisted void formation in front of a crack tip slows down crack propagation.

Original language	English
Title of host publication	Materials Research Society Symposium - Proceedings
Pages	11-22
Number of pages	12
Volume	409
State	Published - Jan 1 1996
Externally published	Yes

Cite this

@inproceedings{68e02d00afac477daa6a423dc6d1b494,

title = "Dynamics and morphology of cracks in silicon nitride films: a molecular dynamics study on parallel computers",

abstract = "Multiresolution molecular dynamics approach on parallel computers has been used to investigate fracture in ceramic materials. In microporous silica, critical behavior at fracture is analyzed in terms of pore percolation and kinetic roughening of fracture surfaces. Crack propagation in amorphous silicon nitride films is investigated, and a correlation between the speed of crack propagation and the morphology of fracture surfaces is observed. In crystalline silicon nitride films, temperature-assisted void formation in front of a crack tip slows down crack propagation.",

author = "Aiichiro Nakano and Kalia, \{Rajiv K.\} and Priya Vashishta",

year = "1996",

month = jan,

day = "1",

language = "English",

volume = "409",

pages = "11--22",

booktitle = "Materials Research Society Symposium - Proceedings",

}

TY - GEN

T1 - Dynamics and morphology of cracks in silicon nitride films: a molecular dynamics study on parallel computers

AU - Nakano, Aiichiro

AU - Kalia, Rajiv K.

AU - Vashishta, Priya

PY - 1996/1/1

Y1 - 1996/1/1

N2 - Multiresolution molecular dynamics approach on parallel computers has been used to investigate fracture in ceramic materials. In microporous silica, critical behavior at fracture is analyzed in terms of pore percolation and kinetic roughening of fracture surfaces. Crack propagation in amorphous silicon nitride films is investigated, and a correlation between the speed of crack propagation and the morphology of fracture surfaces is observed. In crystalline silicon nitride films, temperature-assisted void formation in front of a crack tip slows down crack propagation.

AB - Multiresolution molecular dynamics approach on parallel computers has been used to investigate fracture in ceramic materials. In microporous silica, critical behavior at fracture is analyzed in terms of pore percolation and kinetic roughening of fracture surfaces. Crack propagation in amorphous silicon nitride films is investigated, and a correlation between the speed of crack propagation and the morphology of fracture surfaces is observed. In crystalline silicon nitride films, temperature-assisted void formation in front of a crack tip slows down crack propagation.

UR - https://www.scopus.com/pages/publications/0029780016

M3 - Conference contribution

VL - 409

SP - 11

EP - 22

BT - Materials Research Society Symposium - Proceedings

ER -

Dynamics and morphology of cracks in silicon nitride films: a molecular dynamics study on parallel computers

Abstract

Fingerprint

Cite this