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Electrical transport in GaN nanowires grown by selective epitaxy

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Abstract

The authors report on the electrical transport characteristics of undoped, n -doped, and pn -junction GaN nanowires grown by selective epitaxy on GaN/sapphire substrates. The selective epitaxy is realized by a combination of a patterned Si 3 N 4 mask, which defines the position and diameter of the nanowires, and appropriate growth conditions, which lead to a near one-dimensional growth along the c -direction. They find that the electrical transport in nominally undoped nanowires is dominated by space charge limited conduction, and using a new theory for space charge limited conduction, they extract an electron mobility of ∼400 cm 2 /V s and a free carrier concentration of ∼ 10 15 - 10 16 cm -3. By controlling the nanowire doping, they observe Ohmic transport for n -doped nanowires and rectifying characteristics for pn -junction nanowires. © 2009 American Vacuum Society.
Original languageEnglish
Pages (from-to)2040-2043
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume27
Issue number4
DOIs
StatePublished - Aug 14 2009
Externally publishedYes

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