Electrodeposition and analysis of thick bismuth films

Kendrich O. Hatfield, Enkeleda Dervishi, Don Johnson, Courtney Clark, Nathan Brown, Genevieve C. Kidman, Darrick J. Williams, Daniel E. Hooks

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Due to its unique physical and chemical properties, bismuth is an attractive candidate for a wide range of applications such as battery anodes, radiation shielding, and semiconductors, to name a few. This work presents the electrodeposition of mechanically stable and homogenous bismuth films at micron-scale thicknesses. A simple one-step electrodeposition process using either a pulse/reverse or direct current source yielded thick, homogenous, and mechanically stable bismuth films. Morphology, electrochemical behavior, adhesion, and mechanical stability of bismuth coatings plated with varying parameters were characterized via optical profilometry, cyclic voltammetry, electron microscopy, and tribology. Scratch testing on thick electroplated coatings (> 100 µm) revealed similar wear resistance properties between the pulse/reverse plated and direct current electroplated films. This study presents a versatile bismuth electroplating process with the possibility to replace lead in radiation shields with an inexpensive, non-toxic metal, or to make industrially relevant electrocatalytic devices.

Original languageEnglish
Article number1202
JournalScientific Reports
Volume13
Issue number1
DOIs
StatePublished - Dec 2023

Fingerprint

Dive into the research topics of 'Electrodeposition and analysis of thick bismuth films'. Together they form a unique fingerprint.

Cite this