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Environmental effects of H <inf>2</inf>O on fracture initiation in silicon: A hybrid electronic-density-functional/molecular-dynamics study

  • Shuji Ogata
  • , Fuyuki Shimojo
  • , Rajiv K. Kalia
  • , Aiichiro Nakano
  • , Priya Vashishta

Research output: Contribution to journal › Article › peer-review

42 Scopus citations

Abstract

The effects of environmental molecules on fracture initiation in silicon were discussed. The study was carried out by using a hybrid quantum-mechanical/ molecular-dynamics simulation. The (110) crack surfaces of pure silicon were considered to the environmental effects of H 2O molecules. It was found that, depending on preparation procedures, crack surfaces can be partially saturated by H or other elements.
Original languageEnglish
Pages (from-to)5316-5323
Number of pages8
JournalJournal of Applied Physics
Volume95
Issue number10
DOIs
StatePublished - May 15 2004
Externally publishedYes

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