Erratum: Grain boundary diffusivity of Ni in Au thin films and the associated degradation in electrical contact resistance due to surface oxide film formation (J. Appl. Phys. (2013) 113 (114906))

N. Argibay; M. T. Brumbach; M. T. Dugger; P. G. Kotula

doi:10.1063/1.4803125

Erratum: Grain boundary diffusivity of Ni in Au thin films and the associated degradation in electrical contact resistance due to surface oxide film formation (J. Appl. Phys. (2013) 113 (114906))

N. Argibay
, M. T. Brumbach
, M. T. Dugger
, P. G. Kotula

Research output: Contribution to journal › Comment/debate

1 Scopus citations

Original language	English
Journal	Journal of Applied Physics
Volume	113
Issue number	16
DOIs	https://doi.org/10.1063/1.4803125
State	Published - Apr 28 2013
Externally published	Yes

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10.1063/1.4803125

Cite this

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title = "Erratum: Grain boundary diffusivity of Ni in Au thin films and the associated degradation in electrical contact resistance due to surface oxide film formation (J. Appl. Phys. (2013) 113 (114906))",

author = "N. Argibay and Brumbach, \{M. T.\} and Dugger, \{M. T.\} and Kotula, \{P. G.\}",

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language = "English",

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issn = "0021-8979",

publisher = "American Institute of Physics",

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Erratum: Grain boundary diffusivity of Ni in Au thin films and the associated degradation in electrical contact resistance due to surface oxide film formation (J. Appl. Phys. (2013) 113 (114906)). / Argibay, N.; Brumbach, M. T.; Dugger, M. T. et al.
In: Journal of Applied Physics, Vol. 113, No. 16, 28.04.2013.

Research output: Contribution to journal › Comment/debate

TY - JOUR

T1 - Erratum

T2 - Grain boundary diffusivity of Ni in Au thin films and the associated degradation in electrical contact resistance due to surface oxide film formation (J. Appl. Phys. (2013) 113 (114906))

AU - Argibay, N.

AU - Brumbach, M. T.

AU - Dugger, M. T.

AU - Kotula, P. G.

PY - 2013/4/28

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DO - 10.1063/1.4803125

M3 - Comment/debate

SN - 0021-8979

VL - 113

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 16

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