Field-based simulations of directed self-assembly in a mixed brush system

Su Mi Hur; Amalie L. Frischknecht; Dale L. Huber; Glenn H. Fredrickson

doi:10.1117/12.848416

Field-based simulations of directed self-assembly in a mixed brush system

Su Mi Hur
, Amalie L. Frischknecht
, Dale L. Huber
, Glenn H. Fredrickson

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

Self-assembling block copolymer thin films have attracted considerable attention as a promising high resolution lithographic tool due to the 10 nm scale of microdomain ordering and their facility for modulation of size and pattern. However, for block copolymer lithography to be a viable solution for advanced nano-lithographic technologies, several critical requirements need to be satisfied. Our research has focused on developing complementary mixed polymer brush lithography tools satisfying the required criteria, by means of Self-Consistent Field Theory (SCFT) simulations. Specifically, we have concentrated on graphoepitaxial techniques that are widely tested and considered a particularly promising method for controlling the microdomain ordering. © 2010 Copyright SPIE - The International Society for Optical Engineering.

Original language	English
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Volume	7637
DOIs	https://doi.org/10.1117/12.848416
State	Published - Jun 15 2010
Externally published	Yes

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@inproceedings{ed9039551d8e45f7be7ebf5078f45c68,

title = "Field-based simulations of directed self-assembly in a mixed brush system",

abstract = "Self-assembling block copolymer thin films have attracted considerable attention as a promising high resolution lithographic tool due to the 10 nm scale of microdomain ordering and their facility for modulation of size and pattern. However, for block copolymer lithography to be a viable solution for advanced nano-lithographic technologies, several critical requirements need to be satisfied. Our research has focused on developing complementary mixed polymer brush lithography tools satisfying the required criteria, by means of Self-Consistent Field Theory (SCFT) simulations. Specifically, we have concentrated on graphoepitaxial techniques that are widely tested and considered a particularly promising method for controlling the microdomain ordering. {\textcopyright} 2010 Copyright SPIE - The International Society for Optical Engineering.",

author = "Hur, \{Su Mi\} and Frischknecht, \{Amalie L.\} and Huber, \{Dale L.\} and Fredrickson, \{Glenn H.\}",

year = "2010",

month = jun,

day = "15",

doi = "10.1117/12.848416",

language = "English",

isbn = "9780819480514",

volume = "7637",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

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TY - GEN

T1 - Field-based simulations of directed self-assembly in a mixed brush system

AU - Hur, Su Mi

AU - Frischknecht, Amalie L.

AU - Huber, Dale L.

AU - Fredrickson, Glenn H.

PY - 2010/6/15

Y1 - 2010/6/15

N2 - Self-assembling block copolymer thin films have attracted considerable attention as a promising high resolution lithographic tool due to the 10 nm scale of microdomain ordering and their facility for modulation of size and pattern. However, for block copolymer lithography to be a viable solution for advanced nano-lithographic technologies, several critical requirements need to be satisfied. Our research has focused on developing complementary mixed polymer brush lithography tools satisfying the required criteria, by means of Self-Consistent Field Theory (SCFT) simulations. Specifically, we have concentrated on graphoepitaxial techniques that are widely tested and considered a particularly promising method for controlling the microdomain ordering. © 2010 Copyright SPIE - The International Society for Optical Engineering.

AB - Self-assembling block copolymer thin films have attracted considerable attention as a promising high resolution lithographic tool due to the 10 nm scale of microdomain ordering and their facility for modulation of size and pattern. However, for block copolymer lithography to be a viable solution for advanced nano-lithographic technologies, several critical requirements need to be satisfied. Our research has focused on developing complementary mixed polymer brush lithography tools satisfying the required criteria, by means of Self-Consistent Field Theory (SCFT) simulations. Specifically, we have concentrated on graphoepitaxial techniques that are widely tested and considered a particularly promising method for controlling the microdomain ordering. © 2010 Copyright SPIE - The International Society for Optical Engineering.

UR - https://www.scopus.com/pages/publications/77953303009

U2 - 10.1117/12.848416

DO - 10.1117/12.848416

M3 - Conference contribution

SN - 9780819480514

VL - 7637

BT - Proceedings of SPIE - The International Society for Optical Engineering

ER -

Field-based simulations of directed self-assembly in a mixed brush system

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