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Gain Characterization of p-Doped 1.3 μm InAs Quantum Dot Lasers on Silicon: Theory and Experiment

  • Zeyu Zhang
  • , Daehwan Jung
  • , Justin C. Norman
  • , Pari Patel
  • , Weng W. Chow
  • , John E. Bowers

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We investigate, both experimentally and theoretically, the gain characteristics of modulation p-doped 1.3 μm quantum dot lasers epitaxially grown on silicon. The inhomogeneous broadening is extracted to be 10 meV. A p-doped quantum dot active region has been found to show lower transparency current and higher material gain.
Original languageEnglish
Title of host publicationConference Digest - IEEE International Semiconductor Laser Conference
Pages67-68
Number of pages2
Volume2018-September
DOIs
StatePublished - Oct 30 2018
Externally publishedYes

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