Abstract
GaAs bicrystals have been produced by growing the GaAs directly on Ge bicrystals using the organo-metallic vapor phase epitaxy technique. The use of this new approach is illustrated for the first-order, SIGMA equals 3, twin and for SIGMA equals 5, left bracket 001 right bracket tilt boundary. Both interfaces are invariably faceted. Growth on a left brace 110 right brace substrate also produces numerous microtwins which can lead to the formation of higher-order twin interfaces. This effect is illustrated by the observation of the second-order SIGMA equals 9 interface.
| Original language | English |
|---|---|
| Title of host publication | Institute of Physics Conference Series |
| Pages | 221-226 |
| Number of pages | 6 |
| Edition | 76 |
| State | Published - Dec 1 1985 |
| Externally published | Yes |
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