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Growth of buried metal aluminides and gallides and of rare-earth monopnictides in compound semiconductors. A comparison

  • C. J. Palmstrom
  • , T. Sands
  • , J. P. Harbison
  • , T. G. Finstad
  • , S. Mounier
  • , L. T. Florez
  • , V. G. Keramidas
  • , J. G. Zhu
  • , C. B. Carter

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

Transition metal aluminides and gallides and rare earth monopnictides have been grown as buried conducting layers in III-V compound semiconductor heterostructures. These metallic and semi-metallic compounds have the CsCl and NaCl structures, respectively. The criteria for achieving (100) oriented epitaxial growth on (100)III-V semiconductor surfaces are different for each class of material. The methods used to achieve III-V/metal/III-V heteroepitaxial structures are described. The different approaches needed for the aluminides or gallides and the monopnictides form the basis for a comparative study.
Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Pages85-94
Number of pages10
Volume1285
DOIs
StatePublished - Jan 1 1990
Externally publishedYes

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