Abstract
Transition metal aluminides and gallides and rare earth monopnictides have been grown as buried conducting layers in III-V compound semiconductor heterostructures. These metallic and semi-metallic compounds have the CsCl and NaCl structures, respectively. The criteria for achieving (100) oriented epitaxial growth on (100)III-V semiconductor surfaces are different for each class of material. The methods used to achieve III-V/metal/III-V heteroepitaxial structures are described. The different approaches needed for the aluminides or gallides and the monopnictides form the basis for a comparative study.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
| Pages | 85-94 |
| Number of pages | 10 |
| Volume | 1285 |
| DOIs | |
| State | Published - Jan 1 1990 |
| Externally published | Yes |
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