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Growth of high Indium Percentage InGaSb on InP substrates using the interfacial misfit dislocation array growth mode

  • F. F. Ince
  • , A. T. Newell
  • , K. J. Reilly
  • , S. Seth
  • , T. J. Rotter
  • , A. Mansoori
  • , S. Addamane
  • , D. Shima
  • , L. Miroshnik
  • , B. Rummel
  • , A. Li
  • , T. Sinno
  • , S. M. Han
  • , G. Balakrishnan

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We present the growth of In0.53Ga0.47Sb on InP using the interfacial misfit dislocation growth mode. The growth is performed by using an intermediate InGaAs layer and achieving an As for Sb anion exchange. Characterization results show the formation of an interfacial misfit dislocation array, however the epilayer shows significant phase segregation.
Original languageEnglish
Title of host publication2022 Compound Semiconductor Week, CSW 2022
DOIs
StatePublished - Jan 1 2022
Externally publishedYes

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