Abstract
The application of high-resolution electron microscopy to the study of different structures and defects in compound semiconductors is illustrated. The study of epilayers and interfacial dislocations is illustrated for GaAs/AlxGa1-xAs and GaSb/InAs superlattices. A new method for preparing well defined grain boundaries in GaAs is reported together with new observations of defects produced by ion implantation and annealing of GaAs/AlxGa1-xAs superlattices is discussed. A brief comparison is made between simulated images for a conventional 125 kV machine and a 400 kV machine with 0.18 nm point-to-point resolution. © 1985.
| Original language | English |
|---|---|
| Pages (from-to) | 305-312 |
| Number of pages | 8 |
| Journal | Ultramicroscopy |
| Volume | 18 |
| Issue number | 1-4 |
| DOIs | |
| State | Published - Jan 1 1985 |
| Externally published | Yes |
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