Investigation of hydrogen concentration and hardness of ion irradiated organically modified silicate thin films

Y. Qi; T. Prenzel; T. A. Harriman; Y. Q. Wang; D. A. Lucca; D. Williams; M. Nastasi; J. Dong; A. Mehner

doi:10.1016/j.nimb.2010.02.116

Investigation of hydrogen concentration and hardness of ion irradiated organically modified silicate thin films

Y. Qi
, T. Prenzel
, T. A. Harriman
, Y. Q. Wang
, D. A. Lucca
, D. Williams
, M. Nastasi
, J. Dong
, A. Mehner

Los Alamos National Laboratory

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

A study of the effects of ion irradiation of organically modified silicate thin films on the loss of hydrogen and increase in hardness is presented. NaOH catalyzed SiNa_wO_xC_yH_z thin films were synthesized by sol-gel processing from tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) precursors and spin-coated onto Si substrates. After drying at 300 °C, the films were irradiated with 125 keV H⁺ or 250 keV N²⁺ at fluences ranging from 1 × 10¹⁴ to 2.5 × 10¹⁶ ions/cm². Elastic Recoil Detection (ERD) was used to investigate resulting hydrogen concentration as a function of ion fluence and irradiating species. Nanoindentation was used to measure the hardness of the irradiated films. FT-IR spectroscopy was also used to examine resulting changes in chemical bonding. The resulting hydrogen loss and increase in hardness are compared to similarly processed acid catalyzed silicate thin films.

Original language	English
Pages (from-to)	1997-2000
Number of pages	4
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	268
Issue number	11-12
DOIs	https://doi.org/10.1016/j.nimb.2010.02.116
State	Published - Jun 1 2010

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10.1016/j.nimb.2010.02.116

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Qi, Y., Prenzel, T., Harriman, T. A., Wang, Y. Q., Lucca, D. A., Williams, D., Nastasi, M., Dong, J., & Mehner, A. (2010). Investigation of hydrogen concentration and hardness of ion irradiated organically modified silicate thin films. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 268(11-12), 1997-2000. https://doi.org/10.1016/j.nimb.2010.02.116

@article{4e657548f2f14c5ca18feffbeb0afe6a,

title = "Investigation of hydrogen concentration and hardness of ion irradiated organically modified silicate thin films",

abstract = "A study of the effects of ion irradiation of organically modified silicate thin films on the loss of hydrogen and increase in hardness is presented. NaOH catalyzed SiNawOxCyHz thin films were synthesized by sol-gel processing from tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) precursors and spin-coated onto Si substrates. After drying at 300 °C, the films were irradiated with 125 keV H+ or 250 keV N2+ at fluences ranging from 1 {\texttimes} 1014 to 2.5 {\texttimes} 1016 ions/cm2. Elastic Recoil Detection (ERD) was used to investigate resulting hydrogen concentration as a function of ion fluence and irradiating species. Nanoindentation was used to measure the hardness of the irradiated films. FT-IR spectroscopy was also used to examine resulting changes in chemical bonding. The resulting hydrogen loss and increase in hardness are compared to similarly processed acid catalyzed silicate thin films.",

author = "Y. Qi and T. Prenzel and Harriman, \{T. A.\} and Wang, \{Y. Q.\} and Lucca, \{D. A.\} and D. Williams and M. Nastasi and J. Dong and A. Mehner",

year = "2010",

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doi = "10.1016/j.nimb.2010.02.116",

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Qi, Y, Prenzel, T, Harriman, TA, Wang, YQ, Lucca, DA, Williams, D, Nastasi, M, Dong, J & Mehner, A 2010, 'Investigation of hydrogen concentration and hardness of ion irradiated organically modified silicate thin films', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 268, no. 11-12, pp. 1997-2000. https://doi.org/10.1016/j.nimb.2010.02.116

Investigation of hydrogen concentration and hardness of ion irradiated organically modified silicate thin films. / Qi, Y.; Prenzel, T.; Harriman, T. A. et al.
In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 268, No. 11-12, 01.06.2010, p. 1997-2000.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Investigation of hydrogen concentration and hardness of ion irradiated organically modified silicate thin films

AU - Qi, Y.

AU - Prenzel, T.

AU - Harriman, T. A.

AU - Wang, Y. Q.

AU - Lucca, D. A.

AU - Williams, D.

AU - Nastasi, M.

AU - Dong, J.

AU - Mehner, A.

PY - 2010/6/1

Y1 - 2010/6/1

N2 - A study of the effects of ion irradiation of organically modified silicate thin films on the loss of hydrogen and increase in hardness is presented. NaOH catalyzed SiNawOxCyHz thin films were synthesized by sol-gel processing from tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) precursors and spin-coated onto Si substrates. After drying at 300 °C, the films were irradiated with 125 keV H+ or 250 keV N2+ at fluences ranging from 1 × 1014 to 2.5 × 1016 ions/cm2. Elastic Recoil Detection (ERD) was used to investigate resulting hydrogen concentration as a function of ion fluence and irradiating species. Nanoindentation was used to measure the hardness of the irradiated films. FT-IR spectroscopy was also used to examine resulting changes in chemical bonding. The resulting hydrogen loss and increase in hardness are compared to similarly processed acid catalyzed silicate thin films.

AB - A study of the effects of ion irradiation of organically modified silicate thin films on the loss of hydrogen and increase in hardness is presented. NaOH catalyzed SiNawOxCyHz thin films were synthesized by sol-gel processing from tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) precursors and spin-coated onto Si substrates. After drying at 300 °C, the films were irradiated with 125 keV H+ or 250 keV N2+ at fluences ranging from 1 × 1014 to 2.5 × 1016 ions/cm2. Elastic Recoil Detection (ERD) was used to investigate resulting hydrogen concentration as a function of ion fluence and irradiating species. Nanoindentation was used to measure the hardness of the irradiated films. FT-IR spectroscopy was also used to examine resulting changes in chemical bonding. The resulting hydrogen loss and increase in hardness are compared to similarly processed acid catalyzed silicate thin films.

UR - https://www.scopus.com/pages/publications/77953137074

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DO - 10.1016/j.nimb.2010.02.116

M3 - Article

SN - 0168-583X

VL - 268

SP - 1997

EP - 2000

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

IS - 11-12

ER -

Investigation of hydrogen concentration and hardness of ion irradiated organically modified silicate thin films

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