Skip to main navigation Skip to search Skip to main content

Irradiation-induced grain growth and defect evolution in nanocrystalline zirconia with doped grain boundaries

  • Sanchita Dey
  • , John Mardinly
  • , Yongqiang Wang
  • , James A. Valdez
  • , Terry G. Holesinger
  • , Blas P. Uberuaga
  • , Jeff J. Ditto
  • , John W. Drazin
  • , Ricardo H.R. Castro

Research output: Contribution to journalArticlepeer-review

36 Scopus citations

Abstract

Grain boundaries are effective sinks for radiation-induced defects, ultimately impacting the radiation tolerance of nanocrystalline materials (dense materials with nanosized grains) against net defect accumulation. However, irradiation-induced grain growth leads to grain boundary area decrease, shortening potential benefits of nanostructures. A possible approach to mitigate this is the introduction of dopants to target a decrease in grain boundary mobility or a reduction in grain boundary energy to eliminate driving forces for grain growth (using similar strategies as to control thermal growth). Here we tested this concept in nanocrystalline zirconia doped with lanthanum. Although the dopant is observed to segregate to the grain boundaries, causing grain boundary energy decrease and promoting dragging forces for thermally activated boundary movement, irradiation induced grain growth could not be avoided under heavy ion irradiation, suggesting a different growth mechanism as compared to thermal growth. Furthermore, it is apparent that reducing the grain boundary energy reduced the effectiveness of the grain boundary as sinks, and the number of defects in the doped material is higher than in undoped (La-free) YSZ.

Original languageEnglish
Pages (from-to)16921-16929
Number of pages9
JournalPhysical Chemistry Chemical Physics
Volume18
Issue number25
DOIs
StatePublished - Jan 1 2016

Fingerprint

Dive into the research topics of 'Irradiation-induced grain growth and defect evolution in nanocrystalline zirconia with doped grain boundaries'. Together they form a unique fingerprint.

Cite this