Skip to main navigation Skip to search Skip to main content

Mechanical and electrical coupling at metal-insulator-metal nanoscale contacts

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Mechanical and electrical coupling at nanoscale metallic contacts was investigated using a conducting-probe atomic force microscope (AFM). The current-voltage responses were non-Ohmic, symmetric about zero bias, with conductance values smaller than the quantum conductance limit, which indicate electron tunneling through an insulating layer. Using a self-consistent contact mechanics model and a parabolic tunneling model for thin insulating layers, we determined the contact area, barrier height, and barrier thickness as a function of applied contact load. The results suggest the presence of two insulating layers: an oxide layer on the AFM tip and an organic contaminant layer on the metallic surface. © 2008 American Institute of Physics.
Original languageEnglish
JournalApplied Physics Letters
Volume93
Issue number20
DOIs
StatePublished - Dec 2 2008
Externally publishedYes

Fingerprint

Dive into the research topics of 'Mechanical and electrical coupling at metal-insulator-metal nanoscale contacts'. Together they form a unique fingerprint.

Cite this