OPTICAL DESIGN ISSUES FOR SOFT - RAY PROJECTION LITHOGRAPHY

W. C. Sweatt; D. A. Tichenor; G. D. Kubiak; W. W. Chow; P. D. Rockett; R. E. Olson; T. E. Jewell; O. R. Wood; D. L. Windt; J. E. Bjorkholm; M. D. Himel; A. A. MacDowell

OPTICAL DESIGN ISSUES FOR SOFT - RAY PROJECTION LITHOGRAPHY

W. C. Sweatt
, D. A. Tichenor
, G. D. Kubiak
, W. W. Chow
, P. D. Rockett
, R. E. Olson
, T. E. Jewell
, O. R. Wood
, D. L. Windt
, J. E. Bjorkholm
, M. D. Himel
, A. A. MacDowell

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

A projection lithography tool is being developed to make 100-nm features using 14-nm radiation. Multilayer coatings allow near-normal reflections in this large-field, diffraction-limited system.

Original language	English
Title of host publication	Optics InfoBase Conference Papers
Pages	193
Number of pages	1
State	Published - Jan 1 1993
Externally published	Yes

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@inproceedings{d8b29b63ac8d4eb7bac419501137cac2,

title = "OPTICAL DESIGN ISSUES FOR SOFT - RAY PROJECTION LITHOGRAPHY",

abstract = "A projection lithography tool is being developed to make 100-nm features using 14-nm radiation. Multilayer coatings allow near-normal reflections in this large-field, diffraction-limited system.",

author = "Sweatt, \{W. C.\} and Tichenor, \{D. A.\} and Kubiak, \{G. D.\} and Chow, \{W. W.\} and Rockett, \{P. D.\} and Olson, \{R. E.\} and Jewell, \{T. E.\} and Wood, \{O. R.\} and Windt, \{D. L.\} and Bjorkholm, \{J. E.\} and Himel, \{M. D.\} and MacDowell, \{A. A.\}",

year = "1993",

month = jan,

day = "1",

language = "English",

pages = "193",

booktitle = "Optics InfoBase Conference Papers",

}

TY - GEN

T1 - OPTICAL DESIGN ISSUES FOR SOFT - RAY PROJECTION LITHOGRAPHY

AU - Sweatt, W. C.

AU - Tichenor, D. A.

AU - Kubiak, G. D.

AU - Chow, W. W.

AU - Rockett, P. D.

AU - Olson, R. E.

AU - Jewell, T. E.

AU - Wood, O. R.

AU - Windt, D. L.

AU - Bjorkholm, J. E.

AU - Himel, M. D.

AU - MacDowell, A. A.

PY - 1993/1/1

Y1 - 1993/1/1

N2 - A projection lithography tool is being developed to make 100-nm features using 14-nm radiation. Multilayer coatings allow near-normal reflections in this large-field, diffraction-limited system.

AB - A projection lithography tool is being developed to make 100-nm features using 14-nm radiation. Multilayer coatings allow near-normal reflections in this large-field, diffraction-limited system.

UR - https://www.scopus.com/pages/publications/85135628741

M3 - Conference contribution

SP - 193

BT - Optics InfoBase Conference Papers

ER -

OPTICAL DESIGN ISSUES FOR SOFT - RAY PROJECTION LITHOGRAPHY

Abstract

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