Abstract
We present a new surface treatment that controls selective area quantum well intermixing. A CHF3/O2 plasma in an RIE system is used to form a polymer on localized areas that prevents intermixing.
| Original language | English |
|---|---|
| Title of host publication | Optics InfoBase Conference Papers |
| State | Published - Jan 1 2004 |
| Externally published | Yes |
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