Abstract
A thin-film reaction-couple experiment has been designed for monitoring solid-state reactions in the electron microscope. NiO particles were deposited by chemical-vapor deposition onto bulk α-Al2O3 substrates and electron-transparent α-Al2O3 thin films. The NiO-α-Al2O3 reaction couples were then annealed and the formation and growth of NiAl2O4 were analyzed. Special crystallographic relations have been determined, and effects associated with phase transformation were examined. The experiment allows both NiO/NiAl2O4 and NiAl2O4/α-Al2O3 interfaces to be analyzed from the same reaction couple and provides the opportunity to characterize phase transformation kinetics for a particular interface structure. © 1989.
| Original language | English |
|---|---|
| Pages (from-to) | 249-255 |
| Number of pages | 7 |
| Journal | Ultramicroscopy |
| Volume | 30 |
| Issue number | 1-2 |
| DOIs | |
| State | Published - Jan 1 1989 |
| Externally published | Yes |
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