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Reflection electron microscopy of epilayers grown by molecular beam epitaxy

  • B. C. De Cooman
  • , K. H. Kuesters
  • , C. B. Carter
  • , Tung Hsu
  • , G. Wicks

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Reflection electron microscopy has been used lo obtain surface images of interfaces in epilayers grown by molecular beam epitaxy (MBE). The image contrast arises from differences in structure factors for the surface reflections used in the imaging. The technique is potentially a powerful tool for the study of semiconductor devices grown by MBE, by metal organic chemical vapour deposition, and by liquid-phase epitaxy as it yields cross-sectional images of cleavage planes. © 1984 Taylor & Francis Group, LLC.
Original languageEnglish
Pages (from-to)849-856
Number of pages8
JournalPhilosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties
Volume50
Issue number6
DOIs
StatePublished - Jan 1 1984
Externally publishedYes

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