Abstract
The phenomenon of graphoepitaxy, whereby island nucleation occurs preferentially at steps, is a prime example of a manner in which the substrate morphology (and notable surface steps) can affect the microstructure of as-deposited thin-films. This paper provides a further illustration of the fundamental importance of the substrates morphology to the development of thin-film microstructure, employing the example of TiO2 deposited by pulsed-laser deposition (PLD) directly onto specially prepared (100) MgO TEM foils. The same areas of these foils are imaged booth before and after deposition.
| Original language | English |
|---|---|
| Title of host publication | Materials Research Society Symposium Proceedings |
| Pages | 65-69 |
| Number of pages | 5 |
| Volume | 317 |
| State | Published - Jan 1 1994 |
| Externally published | Yes |
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