Sintering of amorphous Si3N4 nanoclusters: a molecular dynamics study of stress analysis

Jinghan Wang; Kenji Tsuruta; Andrey Omeltchenko; Rajiv K. Kalia; Priya Vashishta

Sintering of amorphous Si₃N₄ nanoclusters: a molecular dynamics study of stress analysis

Jinghan Wang
, Kenji Tsuruta
, Andrey Omeltchenko
, Rajiv K. Kalia
, Priya Vashishta

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

We investigate the onset and growth of the neck between amorphous Si₃N₄ nanoclusters at zero and finite pressures. Local stress fluctuations and atomic self-diffusion in the interface region are found to be responsible for neck formation. External pressure has a dramatic influence on the rate of sintering.

Original language	English
Pages (from-to)	573-578
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	408
State	Published - 1996
Externally published	Yes
Event	Proceedings of the 1996 MRS Fall Symposium - Boston, MA, USA Duration: Nov 27 1995 → Dec 1 1995

Cite this

@article{356decb45b9c432fb730286045618810,

title = "Sintering of amorphous Si3N4 nanoclusters: a molecular dynamics study of stress analysis",

abstract = "We investigate the onset and growth of the neck between amorphous Si3N4 nanoclusters at zero and finite pressures. Local stress fluctuations and atomic self-diffusion in the interface region are found to be responsible for neck formation. External pressure has a dramatic influence on the rate of sintering.",

author = "Jinghan Wang and Kenji Tsuruta and Andrey Omeltchenko and Kalia, \{Rajiv K.\} and Priya Vashishta",

year = "1996",

language = "English",

volume = "408",

pages = "573--578",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Proceedings of the 1996 MRS Fall Symposium ; Conference date: 27-11-1995 Through 01-12-1995",

}

TY - JOUR

T1 - Sintering of amorphous Si3N4 nanoclusters

T2 - Proceedings of the 1996 MRS Fall Symposium

AU - Wang, Jinghan

AU - Tsuruta, Kenji

AU - Omeltchenko, Andrey

AU - Kalia, Rajiv K.

AU - Vashishta, Priya

PY - 1996

Y1 - 1996

N2 - We investigate the onset and growth of the neck between amorphous Si3N4 nanoclusters at zero and finite pressures. Local stress fluctuations and atomic self-diffusion in the interface region are found to be responsible for neck formation. External pressure has a dramatic influence on the rate of sintering.

AB - We investigate the onset and growth of the neck between amorphous Si3N4 nanoclusters at zero and finite pressures. Local stress fluctuations and atomic self-diffusion in the interface region are found to be responsible for neck formation. External pressure has a dramatic influence on the rate of sintering.

UR - https://www.scopus.com/pages/publications/0030315375

M3 - Conference article

AN - SCOPUS:0030315375

SN - 0272-9172

VL - 408

SP - 573

EP - 578

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

Y2 - 27 November 1995 through 1 December 1995

ER -

Sintering of amorphous Si3N4 nanoclusters: a molecular dynamics study of stress analysis

Abstract

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Cite this

Sintering of amorphous Si₃N₄ nanoclusters: a molecular dynamics study of stress analysis