Abstract
Cross-sectional Transmission Electron Microscopy (XTEM) and Raman Spectroscopy were used to study the defect structure of annealed high dose ion-implanted Al//xGa//1// minus //xAs/GaAs (x equals 0. 3) superlattices. The results show clearly that the amount and depth of superlattice layer ion-beam mixing depends on the ion mass and fluence used during implantation. In superlattices that retain their structure after implantation and annealing the distribution of the defects is inhomogeneous: most defects are nucleated in the GaAs layer.
| Original language | English |
|---|---|
| Title of host publication | Institute of Physics Conference Series |
| Pages | 301-306 |
| Number of pages | 6 |
| Edition | 76 |
| State | Published - Dec 1 1985 |
| Externally published | Yes |
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