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STRUCTURE OF ION IMPLANTED Al//xGa//1// minus //xAs/GaAs SUPERLATTICES.

  • B. C. De Cooman
  • , S. H. Chen
  • , C. B. Carter
  • , J. Ralston
  • , G. D. Wicks

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Cross-sectional Transmission Electron Microscopy (XTEM) and Raman Spectroscopy were used to study the defect structure of annealed high dose ion-implanted Al//xGa//1// minus //xAs/GaAs (x equals 0. 3) superlattices. The results show clearly that the amount and depth of superlattice layer ion-beam mixing depends on the ion mass and fluence used during implantation. In superlattices that retain their structure after implantation and annealing the distribution of the defects is inhomogeneous: most defects are nucleated in the GaAs layer.
Original languageEnglish
Title of host publicationInstitute of Physics Conference Series
Pages301-306
Number of pages6
Edition76
StatePublished - Dec 1 1985
Externally publishedYes

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