The importance of Pb-vacancy attractions on diffusion in the Pb/Cu(0 0 1) surface alloy

M. L. Anderson; N. C. Bartelt; B. S. Swartzentruber

doi:10.1016/S0039-6028(03)00644-7

The importance of Pb-vacancy attractions on diffusion in the Pb/Cu(0 0 1) surface alloy

M. L. Anderson
, N. C. Bartelt
, B. S. Swartzentruber

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

The diffusion of lead atoms on the Pb/Cu (00l) surface alloy was investigated by using scanning tunneling microscopy (STM). A vacancy mediated mechanism was said to be reason for the occurrance of diffusion process. Based on the simulations results of electronic structure calculations it was concluded that the vacancy was attracted by the embedded Pb atom.

Original language	English
Pages (from-to)	53-58
Number of pages	6
Journal	Surface Science
Volume	538
Issue number	1-2
DOIs	https://doi.org/10.1016/S0039-6028(03)00644-7
State	Published - Jul 10 2003
Externally published	Yes

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@article{34829e6acdd74c7e9a2229855434d88a,

title = "The importance of Pb-vacancy attractions on diffusion in the Pb/Cu(0 0 1) surface alloy",

abstract = "The diffusion of lead atoms on the Pb/Cu (00l) surface alloy was investigated by using scanning tunneling microscopy (STM). A vacancy mediated mechanism was said to be reason for the occurrance of diffusion process. Based on the simulations results of electronic structure calculations it was concluded that the vacancy was attracted by the embedded Pb atom.",

author = "Anderson, \{M. L.\} and Bartelt, \{N. C.\} and Swartzentruber, \{B. S.\}",

year = "2003",

month = jul,

day = "10",

doi = "10.1016/S0039-6028(03)00644-7",

language = "English",

volume = "538",

pages = "53--58",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier B.V.",

number = "1-2",

}

TY - JOUR

T1 - The importance of Pb-vacancy attractions on diffusion in the Pb/Cu(0 0 1) surface alloy

AU - Anderson, M. L.

AU - Bartelt, N. C.

AU - Swartzentruber, B. S.

PY - 2003/7/10

Y1 - 2003/7/10

N2 - The diffusion of lead atoms on the Pb/Cu (00l) surface alloy was investigated by using scanning tunneling microscopy (STM). A vacancy mediated mechanism was said to be reason for the occurrance of diffusion process. Based on the simulations results of electronic structure calculations it was concluded that the vacancy was attracted by the embedded Pb atom.

AB - The diffusion of lead atoms on the Pb/Cu (00l) surface alloy was investigated by using scanning tunneling microscopy (STM). A vacancy mediated mechanism was said to be reason for the occurrance of diffusion process. Based on the simulations results of electronic structure calculations it was concluded that the vacancy was attracted by the embedded Pb atom.

UR - https://www.scopus.com/pages/publications/0038749308

U2 - 10.1016/S0039-6028(03)00644-7

DO - 10.1016/S0039-6028(03)00644-7

M3 - Article

SN - 0039-6028

VL - 538

SP - 53

EP - 58

JO - Surface Science

JF - Surface Science

IS - 1-2

ER -

The importance of Pb-vacancy attractions on diffusion in the Pb/Cu(0 0 1) surface alloy

Abstract

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