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Ultrahigh brightness XeCl laser system

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The authors describe a large aperture 1-Hz XeCl system designed to deliver 0.5-J subpicosecond pulses and yield intensities on target in excess of 1019 W/cm2. Pulses of 175-fs duration at 616 nm are initially generated in a linear cavity dispersion-compensated dye laser (rhodamine 6G/DODCI) that is synchronously pumped by a CW mode-locked Nd:YAG laser. The amplified 616-nm pulses are then frequency doubled to 308 nm. Preamplification of these pulses to the 2-mJ level is accomplished with a single small-aperture commercial XeCl amplifier. The pulse width at this stage is 240 fs. The beam is then expanded in a vacuum spatial filter before entering the final amplifier, 10 × 10-cm2 aperture device consists of two independently pumped discharge gain regions that share a common X-ray preionizer.

Original languageEnglish
Title of host publicationCONFERENCE ON LASERS AND ELECTRO-0PTICS
Editors Anon
PublisherUnknown Publisher
Pages102-103
Number of pages2
ISBN (Print)1557520860
StatePublished - Dec 1 1989
Event1989 Conference on Lasers and Electro-Optics, CLEO 1989 -
Duration: Dec 1 1989 → …

Publication series

NameCONFERENCE ON LASERS AND ELECTRO-0PTICS

Conference

Conference1989 Conference on Lasers and Electro-Optics, CLEO 1989
Period12/1/89 → …

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