Low Energy Focused Ion Beam Implantation

Michael Titze; Jonathan D. Poplawsky; Barney Doyle; Edward Bielejec; Alex Belianinov

Low Energy Focused Ion Beam Implantation

Michael Titze, Jonathan D. Poplawsky, Barney Doyle, Edward Bielejec, Alex Belianinov

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We performed 1-2 keV focused Au implants into Si, in which the depth was validated by atom-probe tomography. We show that identical results are achievable by either lowering the column voltage, or decelerating ions using bias - while maintaining nanoscale spatial resolution. Furthermore, our data reveal that standard implant modeling overestimates experimental depth by 4.7x and 3.8x at 1 and 2 keV respectively. Finally, we demonstrate how our results pave a way to eV-scale implantation energies, while maintaining high spatial resolution.

Original language	English
Title of host publication	International Conference on Metamaterials, Photonic Crystals and Plasmonics
Pages	1229-1230
Number of pages	2
State	Published - Jan 1 2023
Externally published	Yes

Cite this

@inproceedings{09f280ec1cb04104b8684cd1eaae008e,

title = "Low Energy Focused Ion Beam Implantation",

abstract = "We performed 1-2 keV focused Au implants into Si, in which the depth was validated by atom-probe tomography. We show that identical results are achievable by either lowering the column voltage, or decelerating ions using bias - while maintaining nanoscale spatial resolution. Furthermore, our data reveal that standard implant modeling overestimates experimental depth by 4.7x and 3.8x at 1 and 2 keV respectively. Finally, we demonstrate how our results pave a way to eV-scale implantation energies, while maintaining high spatial resolution.",

author = "Michael Titze and Poplawsky, {Jonathan D.} and Barney Doyle and Edward Bielejec and Alex Belianinov",

year = "2023",

month = jan,

day = "1",

language = "English",

pages = "1229--1230",

booktitle = "International Conference on Metamaterials, Photonic Crystals and Plasmonics",

}

TY - GEN

T1 - Low Energy Focused Ion Beam Implantation

AU - Titze, Michael

AU - Poplawsky, Jonathan D.

AU - Doyle, Barney

AU - Bielejec, Edward

AU - Belianinov, Alex

PY - 2023/1/1

Y1 - 2023/1/1

N2 - We performed 1-2 keV focused Au implants into Si, in which the depth was validated by atom-probe tomography. We show that identical results are achievable by either lowering the column voltage, or decelerating ions using bias - while maintaining nanoscale spatial resolution. Furthermore, our data reveal that standard implant modeling overestimates experimental depth by 4.7x and 3.8x at 1 and 2 keV respectively. Finally, we demonstrate how our results pave a way to eV-scale implantation energies, while maintaining high spatial resolution.

AB - We performed 1-2 keV focused Au implants into Si, in which the depth was validated by atom-probe tomography. We show that identical results are achievable by either lowering the column voltage, or decelerating ions using bias - while maintaining nanoscale spatial resolution. Furthermore, our data reveal that standard implant modeling overestimates experimental depth by 4.7x and 3.8x at 1 and 2 keV respectively. Finally, we demonstrate how our results pave a way to eV-scale implantation energies, while maintaining high spatial resolution.

UR - http://www.scopus.com/inward/record.url?scp=85174613471&partnerID=8YFLogxK

M3 - Conference contribution

SP - 1229

EP - 1230

BT - International Conference on Metamaterials, Photonic Crystals and Plasmonics

ER -

Low Energy Focused Ion Beam Implantation

Abstract

Fingerprint

Cite this